乐鱼app(中国)官方网站

Adnano-tek中国区联系方式  于淼 :152 2727 0411 yumiao@adnano-tek.com 

 

脉冲脉冲光加温不单单仅加温发展快,更至关重要的是它的安稳性与加温均衡的性质,不一般当今社会电容丝加温器所可以对比的。大家的脉冲脉冲光加温仅有土样拖是热的,其它的组件对比常用加温器当今社会能比冷,故它的机械厂性就对比好。不会轻易在真海上卡住,也可以是大有上升时间的放气,导致土样外表面上此前的溶物又回镀到土样的外表面上,她是脉冲脉冲光加温最大的的影响,时候所以咧加温器没有蒸空腔肚子里,故不会轻易有加温器出现故障的现象。

 

自己的激光行业器手术供暖器供暖样本架在一切PLD的技术应该用里有游戏极限的激光行业器手术热效率200W,所以说可不会是随意的顺利到达1000华氏度上文的水温,有时尤好裕。当样本的成长须要高标准气压的时分,热效率很快跟随,不须要缓慢等样本由冷变热反回原來的水温。可不会连接红外线气温测量仪,量测样本外观的现实水温。自己有两寸激光行业器手术供暖器与高热效率的触酶促使剂的技术应该用。青睐很多完美家来院在线咨询。

 

企业用企业的皮秒激光受热器顺利完成的可以帮助数位实验家满足了受热温度因素低的状况。

 

5-AXES UHV LASER HEATING MANIPULATOR

 

MAIN SPECIFICATIONS:

  • Laser power: 200W
  • Substrate size: 10x10 mm2 (up to 1-in dia)
  • Heating temperature 1200°C (E-3 torr and below) or 1000°C (above E-3 torr) Fully compatible to oxygen-rich or any atmospheric condition
  • ±1°C temperature stability
  • PID temperature control
  • XYZ axis movements
  • 360° continuous rotation
  • 5° substrate tilt
  • Fan and Water cooling system
  • Pneumatic substrate shutter
  • Real-time temperature monitor by pyrometer (single wavelength, can monitor > 260°C)
  • State-of-the-art and easy operation computer software control
  • For high temperature applications
  • For Oxide-, or any atmospheric condition applications
  • Compatible with all UHV systems
  • Customizable

COMPATIBILITY TO OXYGEN-RICH OR ANY ATMOSPHERIC CONDITIONS

 

 

Designing a high temperature heater for UHV thin-film deposition systems which can work in oxygen-rich or any atmospheric conditions is not easy. Conventional heating materials and mechanisms generate additional vapor pressure from its heating component materials which limits the achievable UHV condition, and oxidize its heating components which consequently deteriorate the heating material and process quality

There are some techniques to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. However, each methods has their own issues, such as high maintenance frequency, short life time due to oxidation of heating components, etc.

 

乐鱼appTek's Laser heating manipulator is developed as a perfect solution for heating your sample for UHV thin-layer deposition in oxygen-rich and any atmospheric conditions. It does not possess the disadvantages that other heaters have. In addition, it is easy-to-use, compact, customizable, and has fast and localized heating mechanism. It is equipped with a pyrometer to monitor the temperature, and has a system control software to automatically control the laser heating parameters and processes.  乐鱼appTek's Laser Heating Manipulator is very suitable for laser oxide/nitride epitaxial techniques.

 

LASER CONTROLLER COMBINES NUMBER OF LEADING TECHNOLOGIES SUCH AS...

  • Laser heater module with power supply (standard 200W)
  • Optical fiber
  • Focusing lens with adjustable support
  • Infrared pyrometer for temperature monitoring (with adjustable support)
  • PID temperature control
  • RS232 communication port for remote controlling
  • Control software for real time temperature monitoring, controlling, and alarm

ADVANTAGES

  • Heating temperature 1200°C (E-3 torr and below) or 1000°C (above E-3 torr) Fully compatible to oxygen-rich or any atmospheric condition
  • No heating components adds in vapor pressure in the chamber
  • Localized heated area, lesser out-gassing during heating (you can deposit with a cleaner condition)
  • Can process with rapid temperature ramping
  • Easier maintenance compare to traditional substrate heater (the heating element is outside of the vacuum)
  • Direct temperature measurement from sample/substrate by pyrometer

OPTIONAL

  • Liquid nitrogen cooling
  • Customizable manipulator
  • Pulsed heating mode
                                             
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